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1-5MHz high-frequency drive: a new option for semiconductor cleaning

Megohmonic nozzles deliver 0.2-
micron removal with uniform, no-blind-spot coverage.

We provide non-standard customization services based on customer applications.

Product Information

MegaPie

MegaPie

1 Models

Close-fitting nozzle megasonic cleaning places the sound generator close to the workpiece, using megahertz high-energy waves and cleaning chemistry to remove nanoscale particles and contaminants in high aspect ratio micropores without damaging precision surfaces. Its concentrated, low-loss sound energy and high efficiency make it ideal for ultra-precision cleaning in semiconductor, optics, and medical fields, enabling efficient, precise, low-noise ultrasonic processing.

Product Model Frequency Maximum power Power adjustment Power supply voltage Details
HKD-MegPie-1M250W 1MHz 250W 5-250W 220VAC±10%

Focusing on cutting-edge fields to solve precision-cleaning challenges

Megasonic nozzles with a conformal design provide megasonic-level cleanliness assurance for customers with high-yield requirements.

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Adapt to different industry needs

Provides more efficient, practical, and flexible ultra-clean precision manufacturing solutions for semiconductor silicon wafers, photovoltaics, and other fields.

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Nanoscale cleanliness with no dead angles

The specially designed, contoured nozzle targets the complex curved surfaces and crevices of precision parts, employing a "fitted" nano-level impurity removal process to solve the problem of hard-to-reach areas that traditional cleaning methods struggle to reach.

哈科迪

Precision cleaning with zero damage

Precise energy control, through non-destructive surface technology, avoids the scratches and corrosion problems of traditional cleaning, meeting stringent cleaning requirements that do not damage surfaces.

哈科迪

Adapt to different industry needs

Provides more efficient, practical, and flexible ultra-clean precision manufacturing solutions for semiconductor silicon wafers, photovoltaics, and other fields.

哈科迪

Nanoscale cleanliness with no dead angles

The specially designed, contoured nozzle targets the complex curved surfaces and crevices of precision parts, employing a "fitted" nano-level impurity removal process to solve the problem of hard-to-reach areas that traditional cleaning methods struggle to reach.

哈科迪

Precision cleaning with zero damage

Precise energy control, through non-destructive surface technology, avoids the scratches and corrosion problems of traditional cleaning, meeting stringent cleaning requirements that do not damage surfaces.

0.2-submicron removal with precision manufacturing for ultra-clean results

Making precision manufacturing simpler, and upgrading cleanroom standards

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Innovative nozzle design

The seamless fit design overcomes the challenges of cleaning complex structures and solves industry pain points.

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Flexible response to multiple scenarios

Precisely matches wafers and semiconductor devices of different sizes, eliminating the need for custom-designed equipment for a single scenario and improving equipment utilization.

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Constant power stable output

Precise power control, adaptable to various processes, avoiding uneven cleaning caused by power fluctuations.

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Real-time frequency tracking (PLL)

Maximizes energy output, resulting in more efficient and stable cleaning, and significantly reduces maintenance costs.

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Waveform modulation and sweep frequency drive

Customizable trajectories and comprehensive coverage of complex working conditions further ensure cleaning consistency and safety.

Brand competitiveness

Breaking through technological barriers, we have successfully developed internationally competitive megasonic cleaning equipment and process systems.

The first domestic enterprise specializing in research

HKD, as China's first high-tech enterprise focusing on the independent research and development of megasonic modules for semiconductor wet cleaning equipment, has successfully developed a series of megasonic nanoscale cleaning products, helping China's semiconductor industry chain achieve independent control over key technologies.

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Multi-scenario customized services

As an innovator in the field of megasonic nanoscale cleaning, Hacody leverages its fully independent intellectual property system and flexible customization capabilities to launch different products and services for industries such as semiconductors, optics, and medical, precisely matching the cleaning pain points of different scenarios and helping industrial upgrading.

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Strong independent R&D team

Led by Professor Long Zhili of Harbin Institute of Technology, the company has a core technical team of over 30 people and owns the Shenzhen Advanced Manufacturing National Key Laboratory—ASM-Harbin Institute of Technology Semiconductor Packaging Laboratory. It deeply integrates industry, academia and research, and has obtained 4 invention patents in this field, as well as the quality management system certification GB/T19001-2016/ISO9001:2015.

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Fast and timely after-sales response

Based in Shenzhen, Hakody leverages its strong manufacturing capabilities to shorten the entire cycle from order placement to delivery. It offers high cost-performance, fast service response, and can reach the user's site within 24 hours to quickly solve problems for customers, giving you peace of mind.

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