Single or batch cleaning is available to meet the needs of different scenarios.

Trough megasonic: nanometer cleanliness with zero damage.

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Home > Product > Trough-type Megasonic Wave

Product Information

Single-piece Tank

1 Models

Single-chip megasonic cleaners use high-frequency shear forces from megasonic waves in liquids, plus cleaning agents, to efficiently clean silicon wafers and other objects without surface damage. A generator drives a transducer to emit megahertz sound waves that speed up cleaning agent molecules, creating high-speed fluid shear that removes nanoscale particles from surfaces and high-aspect-ratio micropores.

Product Model	Frequency	Maximum power	Power adjustment	Power supply voltage	Details
HKD-STank-1M765W	1MHz	765W	10～765W	220VAC±10%

Multi-piece Sink

1 Models

The multi-wafer megasonic cleaning system uses high-frequency shear forces in liquid, combined with cleaning chemistry, to efficiently remove nanoscale particles without damaging wafer surfaces. Its short wavelength enables deep cleaning of high aspect ratio micropores, meeting precision cleaning needs in semiconductors, optics, and high-end medical fields. As a key SCI multi-wafer cleaning step, it offers multiple control modes, supports local/remote communication, and provides linearly adjustable 1200W power to match different process requirements.

Product Model	Frequency	Maximum power	Power adjustment	Power supply voltage	Details
HKD-MTank-1M1200W	1MHz	1200W	10-1200W	220VAC±10%

Targeting high-value sectors with precise alignment to needs.

Tank-type megasonic cleaner: Ushering in a new era of ultra-precision cleaning

Nanoscale microparticle removal

1-5MHz mega-sonic vibration + 800W high-power output can remove nano-sized microparticles and easily remove impurities from high aspect ratio micropores, meeting the "zero-defect" cleaning standard in chip manufacturing.

Adapt to different industry needs

We provide more efficient, practical, and flexible ultra-clean precision manufacturing solutions for precision cleaning in the microelectronics industry, including semiconductor silicon wafers, medical devices, optical devices, and displays.

Intelligent adaptive control

It enables wafer chemical polishing or remote RS485, USB, and Ethernet communication control, as well as I/O port control, allowing for linear power adjustment from 765W to 1200W to ensure precise matching of cleaning intensity to different process requirements.

Nanoscale microparticle removal

Adapt to different industry needs

Intelligent adaptive control

Improve cleaning efficiency and reduce compliance costs

From small-batch R&D and pilot production to large-scale mass production ramp-up, a single technology covers the entire lifecycle.

Constant power stable output

Precise power control, adaptable to various processes, avoiding uneven cleaning caused by power fluctuations.

Real-time frequency tracking (PLL)

Maximizes energy output, resulting in more efficient and stable cleaning, and significantly reduces maintenance costs.

Online monitoring of cleaning quality

Real-time monitoring of parameters such as impedance, power, and temperature provides automatic early warnings and reduces risks.

Waveform modulation and sweep frequency drive

Customizable trajectories and comprehensive coverage of complex working conditions further ensure cleaning consistency and safety.

High cleaning efficiency

You can choose between single-item cleaning and batch cleaning depending on the actual situation, improving efficiency by 30%.

Brand competitiveness

Breaking through technological barriers, we have successfully developed internationally competitive megasonic cleaning equipment and process systems.

The first domestic enterprise specializing in research

HKD, as China's first high-tech enterprise focusing on the independent research and development of megasonic modules for semiconductor wet cleaning equipment, has successfully developed a series of megasonic nanoscale cleaning products, helping China's semiconductor industry chain achieve independent control over key technologies.

Multi-scenario customized services

As an innovator in the field of megasonic nanoscale cleaning, Hacody leverages its fully independent intellectual property system and flexible customization capabilities to launch different products and services for industries such as semiconductors, optics, and medical, precisely matching the cleaning pain points of different scenarios and helping industrial upgrading.

Strong independent R&D team

Led by Professor Long Zhili of Harbin Institute of Technology, the company has a core technical team of over 30 people and owns the Shenzhen Advanced Manufacturing National Key Laboratory—ASM-Harbin Institute of Technology Semiconductor Packaging Laboratory. It deeply integrates industry, academia and research, and has obtained 4 invention patents in this field, as well as the quality management system certification GB/T19001-2016/ISO9001:2015.

Fast and timely after-sales response

Based in Shenzhen, Hakody leverages its strong manufacturing capabilities to shorten the entire cycle from order placement to delivery. It offers high cost-performance, fast service response, and can reach the user's site within 24 hours to quickly solve problems for customers, giving you peace of mind.

Tailored related product recommendations.

Choose the product that best suits your needs; customization is also available.

Trough-type Megasonic Wave

800W single-tank or multi-tank design allows for flexible stacking, increasing cleaning efficiency by 30%.

Megasonic Nozzle

1-5MHz megasonic high-frequency vibration, 60W precise power control

MegaPie

0.2 submicron particle removal rate, uniform coverage without dead corners

Trough megasonic: nanometer cleanliness with zero damage.

Product Information

Single-piece Tank

Multi-piece Sink

Targeting high-value sectors with precise alignment to needs.

Nanoscale microparticle removal

Adapt to different industry needs

Intelligent adaptive control

Nanoscale microparticle removal

Adapt to different industry needs

Intelligent adaptive control

Improve cleaning efficiency and reduce compliance costs

Constant power stable output

Real-time frequency tracking (PLL)

Online monitoring of cleaning quality

Waveform modulation and sweep frequency drive

High cleaning efficiency

Brand competitiveness

The first domestic enterprise specializing in research

Multi-scenario customized services

Strong independent R&D team

Fast and timely after-sales response

Tailored related product recommendations.

Trough-type Megasonic Wave

Megasonic Nozzle

MegaPie

Product

Application

Megasonic Technology

After-Sales Service

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