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HaKeDi megasonic slotted megasonic nozzle-type megasonic and bonding-type megasonic nozzles
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1-5MHz high-frequency drive: a new option for semiconductor cleaning

Megohmonic nozzles deliver 0.2-
micron removal with uniform, blind-spot-free coverage.

We provide non-standard customization services based on customer applications.

Customize instantly on request
Home  >   Product  >   Megasonic Nozzle

Product Information

Megasonic Nozzle

Megasonic Nozzle

3 Models

The nozzle-type megasonic cleaning system uses specially designed nozzles to generate high-frequency sound waves and focus high-pressure, high-speed fluid onto the surface, which, combined with cleaning chemistry, efficiently removes particles and grease. It enables directional, efficient sound energy transmission, reducing energy loss by over 30% compared with tank systems, avoiding uneven sound fields and secondary contamination, and providing efficient, flexible ultra-clean solutions for semiconductors, precision optics, and medical devices.

Product Model Frequency Maximum power Power adjustment Power supply voltage Details
HKD-Jet-1M60W 1MHz 60W 5-60W 220VAC±10%
HKD-Jet-1M40W 1MHz 40W 5-40W 220VAC±10%
HKD-Jet-1M20W 1MHz 20W 5-20W 220VAC±10%

Focusing on cutting-edge fields to solve precision cleaning challenges.

Megasonic nozzles with a conformal design provide megasonic-level cleanliness assurance for customers with high-yield requirements.

哈科迪

Adapt to different industry needs

Provides more efficient, practical, and flexible ultra-clean precision manufacturing solutions for semiconductor silicon wafers, photovoltaics, and other fields.

哈科迪

Nanoscale cleanliness with no dead angles

The specially designed, contoured nozzle targets the complex curved surfaces and crevices of precision parts, employing a "fitted" nano-level impurity removal process to solve the problem of hard-to-reach areas that traditional cleaning methods struggle to reach.

哈科迪

Precision cleaning with zero damage

Precise energy control, through non-destructive surface technology, avoids the scratches and corrosion problems of traditional cleaning, meeting stringent cleaning requirements that do not damage surfaces.

哈科迪

Adapt to different industry needs

Provides more efficient, practical, and flexible ultra-clean precision manufacturing solutions for semiconductor silicon wafers, photovoltaics, and other fields.

哈科迪

Nanoscale cleanliness with no dead angles

The specially designed, contoured nozzle targets the complex curved surfaces and crevices of precision parts, employing a "fitted" nano-level impurity removal process to solve the problem of hard-to-reach areas that traditional cleaning methods struggle to reach.

哈科迪

Precision cleaning with zero damage

Precise energy control, through non-destructive surface technology, avoids the scratches and corrosion problems of traditional cleaning, meeting stringent cleaning requirements that do not damage surfaces.

0.2 submicron removal for ultra-clean precision.

Making precision manufacturing simpler, and upgrading cleanroom standards.

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Innovative nozzle design

The seamless fit design overcomes the challenges of cleaning complex structures and solves industry pain points.

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Flexible response to multiple scenarios

Precisely matches wafers and semiconductor devices of different sizes, eliminating the need for custom-designed equipment for a single scenario and improving equipment utilization.

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Constant power stable output

Precise power control, adaptable to various processes, avoiding uneven cleaning caused by power fluctuations.

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Real-time frequency tracking (PLL)

Maximizes energy output, resulting in more efficient and stable cleaning, and significantly reduces maintenance costs.

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Waveform modulation and sweep frequency drive

Customizable trajectories and comprehensive coverage of complex working conditions further ensure cleaning consistency and safety.

Brand competitiveness

Breaking through technological barriers, we have successfully developed internationally competitive megasonic cleaning equipment and process systems.

The first domestic enterprise specializing in research

HKD, as China's first high-tech enterprise focusing on the independent research and development of megasonic modules for semiconductor wet cleaning equipment, has successfully developed a series of megasonic nanoscale cleaning products, helping China's semiconductor industry chain achieve independent control over key technologies.

01

Multi-scenario customized services

As an innovator in the field of megasonic nanoscale cleaning, Hacody leverages its fully independent intellectual property system and flexible customization capabilities to launch different products and services for industries such as semiconductors, optics, and medical, precisely matching the cleaning pain points of different scenarios and helping industrial upgrading.

02

Strong independent R&D team

Led by Professor Long Zhili of Harbin Institute of Technology, the company has a core technical team of over 30 people and owns the Shenzhen Advanced Manufacturing National Key Laboratory—ASM-Harbin Institute of Technology Semiconductor Packaging Laboratory. It deeply integrates industry, academia and research, and has obtained 4 invention patents in this field, as well as the quality management system certification GB/T19001-2016/ISO9001:2015.

03

Fast and timely after-sales response

Based in Shenzhen, Hakody leverages its strong manufacturing capabilities to shorten the entire cycle from order placement to delivery. It offers high cost-performance, fast service response, and can reach the user's site within 24 hours to quickly solve problems for customers, giving you peace of mind.

04

Tailored related product recommendations.

Choose the product that best suits your needs; customization is also available.

Trough-type Megasonic Wave

800W single-tank or multi-tank design allows for flexible stacking, increasing cleaning efficiency by 30%.

Trough-type Megasonic Wave

Megasonic Nozzle

1-5MHz megasonic high-frequency vibration, 60W precise power control

Megasonic Nozzle

MegaPie

0.2 submicron particle removal rate, uniform coverage without dead corners

MegaPie

Product

Trough-type Megasonic Wave Megasonic Nozzle MegaPie

Application

Semiconductor Silicon Wafers Optical Devices Medical Devices Photovoltaic Industry Precision Parts Other Industries

Megasonic Technology

After-Sales Service

About HaKeDi

Getting Closer To HaKeDi Corporate Culture

News

Company News Professional Classroom Client Cases

Contact Us

Building B9, Plot A-5, Tongfuyu Industrial Park, Buyong, Shajing, Bao'an District, Shenzhen, Room 518104

Ms. Zhang：13530195612

© 2025 HaKeDi Megasonic Technology (Shenzhen) Co., LTD All Rights Reserved.

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